Characterization of multilayer thin film structures by differential reflection spectroscopy

Materials Research Bulletin

Volumn 31, Issue 12, 1996, Pages 1449-1461

  Hagmann, D R ^a   Hummel, R E ^a  

^a UNIVERSITY OF FLORIDA   (United States)

Author keywords

A. semiconductors; A. thin films; B. vapor deposition; D. optical properties; D. surface properties

Indexed keywords

MATHEMATICAL MODELS; REFLECTION; REFLECTOMETERS; SEMICONDUCTING SILICON COMPOUNDS; SILICA; SILICON NITRIDE;

DIFFERENTIAL REFLECTION SPECTROSCOPY; DIFFERENTIAL REFLECTOGRAMS; MULTILAYER THIN FILMS;

THIN FILMS;

EID: 0030406267     PISSN: 00255408     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0025-5408(96)00153-5     Document Type: Article

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