On the possibility of tailoring a compositional gradient in thin films sputtered from a MoSi2 + XSiC composite target

Surface and Coatings Technology

Volumn 86-87, Issue PART 1, 1996, Pages 33-40

  Govindarajan, S ^a   Moore, J J ^a   Mishra, B ^a   Olson, D L ^a   Ohno, T ^a   Disam, J ^b  

^a Department of Metallurgical and Materials Engineering   (United States)

^b SCHOTT AG   (Germany)

Author keywords

Bias deposition; Composite film; Molybdenum disilicide; R.f. Magnetron sputtering

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; CHEMICAL MODIFICATION; COMPOSITE MATERIALS; MAGNETRON SPUTTERING; MOLYBDENUM COMPOUNDS; OXIDATION; SCANNING ELECTRON MICROSCOPY; SILICON CARBIDE; X RAY DIFFRACTION ANALYSIS;

BIAS DEPOSITION; COMPOSITIONAL GRADIENT; MOLYBDENUM DISILICIDE; TAILORING;

THIN FILMS;

EID: 0030405562     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(96)03031-9     Document Type: Article

References (6)

1. S. Govindarajan et al., in N. Dahotre, J.M. Hampikian, and J.J. Stiglich (eds.), Elevated Temperature Coatings: Science and Technology I, Proceedings of TMS Materials Week '94, Rosemont, IL, October 5-8, p. 291.
2. S. Govindarajan et al. Surf. Coat. Technol., 68/69 (1994) 45.
3. S. Govindarajan et al. Surf. Coat. Technol., 76/77 (1995) 7.
4. S. Govindarajan et al., in T.S. Srivatsan and J.J. Moore (eds.), Processing and Fabrication of Advanced Materials, IV, TMS, p. 795.
5. J.L. Vossen and W. Kern, (eds.), Thin Film Processes, Academic Press, New York, 1978, p. 15.
6. S. Govindarajan et al, in T.S. Srivatsan and J.J. Moore (eds.), Processing and Fabrication of Advanced Materials, IV, TMS, p. 275.