Lamp-heated rapid vapor-phase doping technology for 100-GHz Si bipolar transistors

Proceedings of the IEEE Bipolar/BiCMOS Circuits and Technology Meeting

Volumn , Issue , 1996, Pages 173-176

  Kiyota, Yukihiro ^a   Ohue, Eiji ^a   Onai, Takahiro ^a   Washio, Katsuyoshi ^a   Tanabe, Masamichi ^a   Inada, Taroh ^a  

^a Showa Denko KK   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CARRIER CONCENTRATION; DIFFUSION IN SOLIDS; SEMICONDUCTING SILICON; SEMICONDUCTOR DOPING; THERMAL EFFECTS; VAPOR PHASE EPITAXY;

RAPID VAPOR PHASE DOPING (RVD);

BIPOLAR TRANSISTORS;

EID: 0030403812     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (6)