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Volumn 369, Issue 1-3, 1996, Pages 231-247

Geometric and electronic structure of sulfided Ni films on W(001) studied by low-energy alkali ion scattering and soft X-ray photoemission

(2) Overbury, S H a Mullins, D R a

a OAK RIDGE NATIONAL LABORATORY (United States)

Author keywords

Chemisorption; Low energy ion scattering; Metallic films; Nickel; Soft X ray photoemission; Sulfidation; Surface structure; Tungsten

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; BINDING ENERGY; CHEMISORPTION; ELECTRONIC STRUCTURE; HIGH TEMPERATURE EFFECTS; LOW ENERGY ELECTRON DIFFRACTION; NICKEL; PHOTOEMISSION; SURFACE STRUCTURE; TUNGSTEN; VAPOR DEPOSITION; X RAY SPECTROSCOPY;

LOW ENERGY ALKALI ION SCATTERING; SOFT X RAY PHOTOEMISSION SPECTROSCOPY; SULFIDATION;

METALLIC FILMS;

EID: 0030403317 PISSN: 00396028 EISSN: None Source Type: Journal
DOI: 10.1016/S0039-6028(96)00889-8 Document Type: Article

Times cited : (2)

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