Low resistivity Mo-W alloy for a-Si TFT gate electrode

Materials Research Society Symposium - Proceedings

Volumn 403, Issue , 1996, Pages 675-680

  Hara, Y ^a   Atsuta, M ^a   Oka, T ^a   Tsuji, Y ^a   Ogawa, Y ^a   Takemura, M ^a   Ikeda, M ^a   Suzuki, K ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC CONDUCTIVITY; ELECTRODES; GATES (TRANSISTOR); LIQUID CRYSTAL DISPLAYS; MAGNETRON SPUTTERING; MOLYBDENUM COMPOUNDS; THIN FILM TRANSISTORS; TRANSISTORS;

ELECTRICAL STABILITY; GATE BUSLINES; GATE ELECTRODES; PROCESS YIELD;

MOLYBDENUM ALLOYS;

EID: 0030402917     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (7)