Current dependence of reversible electromigration induced resistance changes in short Al lines and interpretation of irreversible effects

Materials Research Society Symposium - Proceedings

Volumn 428, Issue , 1996, Pages 121-126

  Verbruggen, A H ^a   Van Den Homberg, M J C ^a   Kalkman, A J ^a   Kraayeveld, J R ^a   Willemsen, A W J ^a   Radelaar, S ^a  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CRITICAL CURRENT DENSITY (SUPERCONDUCTIVITY); ELECTRIC RESISTANCE; ELECTRIC RESISTANCE MEASUREMENT; SEMICONDUCTING ALUMINUM COMPOUNDS; THERMAL STRESS;

UNPASSIVATED ALUMINUM LINES;

ELECTROMIGRATION;

EID: 0030400464     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-428-121     Document Type: Conference Paper

References (8)