Modeling of selective tungsten low-pressure chemical vapor deposition

Thin Solid Films

Volumn 290-291, Issue , 1996, Pages 406-410

  Kuijlaars, K J ^a   Kleijn, C R ^a   Van Den Akker, H E A ^a  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

Chemical vapour deposition; Tungsten

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CODES (SYMBOLS); COMPUTATIONAL FLUID DYNAMICS; COMPUTER SIMULATION; MATHEMATICAL MODELS; NUCLEATION; PARTIAL DIFFERENTIAL EQUATIONS; PRESSURE EFFECTS; REACTION KINETICS; TUNGSTEN;

SOFTWARE PACKAGE PHOENICS CVD;

METALLIC FILMS;

EID: 0030400152     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(96)09185-7     Document Type: Article

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