Effect of process control in oxide-confined top-emitting lasers

Conference Digest - IEEE International Semiconductor Laser Conference

Volumn , Issue , 1996, Pages 83-84

  Li, Melissa Y ^a   Yuen, Wupen ^a   Li, Gabriel S ^a   Chang Hasnain, Constance J ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

LEAKAGE CURRENTS; LIGHT POLARIZATION; MIRRORS; OXIDATION; OXIDES; PROCESS CONTROL; SEMICONDUCTING ALUMINUM COMPOUNDS; SEMICONDUCTING GALLIUM ARSENIDE; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR DEVICE STRUCTURES; SEMICONDUCTOR QUANTUM WELLS;

LOW TEMPERATURE WET OXIDATION TECHNIQUE; VERTICAL CAVITY SURFACE EMITTING LASERS;

SEMICONDUCTOR LASERS;

EID: 0030399314     PISSN: 08999406     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (5)