Phase and mechanical stress in and surrounding TiSi2 and CoSi2 lines studied by micro-Raman spectroscopy

Materials Research Society Symposium - Proceedings

Volumn 427, Issue , 1996, Pages 47-52

  De Wolf, I ^a   Howard, D J ^a   Maex, K ^a   Maes, H E ^a  

^a Interuniversity electronic Cent   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

LITHOGRAPHY; MATHEMATICAL MODELS; RAMAN SPECTROSCOPY; STRESS ANALYSIS;

METAL SILICIDES;

SEMICONDUCTING SILICON COMPOUNDS;

EID: 0030397919     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (9)