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Volumn 290-291, Issue , 1996, Pages 238-242

The ultimate vacuum pressure and the characteristics of sputtered coatings

Author keywords

Coatings; Roughness; Sputtering; Ultimate vacuum pressure

Indexed keywords

ADHESION; ETCHING; HARDNESS; ION BOMBARDMENT; MAGNETRON SPUTTERING; SPUTTER DEPOSITION; SURFACE ROUGHNESS;

EID: 0030397794     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(96)09178-X     Document Type: Article
Times cited : (6)

References (12)
  • 6
    • 0004071199 scopus 로고    scopus 로고
    • Powder Diffraction Files cards N_ 38-1420 and 25-1257, International Center for Powder Diffraction Data, Swarthmore, PA
    • Joint Committee on Powder Diffraction Standards, Powder Diffraction Files cards N_ 38-1420 and 25-1257, International Center for Powder Diffraction Data, Swarthmore, PA.
    • Joint Committee on Powder Diffraction Standards
  • 8
    • 0041821583 scopus 로고
    • Ph.D. Thesis, Université de Nantes, Chapter 2
    • J.M. Poitevin, Ph.D. Thesis, Université de Nantes, Chapter 2, 1985, p. 15.
    • (1985) , pp. 15
    • Poitevin, J.M.1
  • 9
    • 0038318160 scopus 로고
    • J.L. Vossen and W. Kern (eds.), Academic Press, London, Chapt. V, and references cited therein
    • C.M. Melliar-Smith and C.J. Mogab, in J.L. Vossen and W. Kern (eds.), Thin Film Processes, Academic Press, London, Chapt. V, 1978, p. 497, and references cited therein.
    • (1978) Thin Film Processes , pp. 497
    • Melliar-Smith, C.M.1    Mogab, C.J.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.