Photoemission yield study of the Fermi level position of the copper phthalocyanine thin films

Electron Technology (Warsaw)

Volumn 29, Issue 2-3, 1996, Pages 326-328

  Szuber, J ^a   Grzadziel, L ^a   Krol, A ^a  

^a SILESIAN UNIVERSITY OF TECHNOLOGY   (Poland)

Author keywords

[No Author keywords available]

Indexed keywords

EMISSION SPECTROSCOPY; ENERGY GAP; FERMI LEVEL; INTERFACES (MATERIALS); OXYGEN; PHOTOEMISSION; THIN FILMS;

PHOTOEMISSION YIELD SPECTROSCOPY (YPS); ULTRA HIGH VOLTAGE ANNEALED COPPER PHTHALOCYANINE (CUPC) THIN FILMS; VACUUM EVAPORATION METHOD;

SEMICONDUCTING FILMS;

EID: 0030397779     PISSN: 00709816     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (26)