-
1
-
-
30244553432
-
Scaling of conventional MOSFETs to the 0.1 μm regime
-
(Edited by Ryssel/Pichler). Springer, Wien
-
M. J. van Dort, J. W. Slotboom and P. H. Woerlee, Scaling of conventional MOSFETs to the 0.1 μm regime, in Simulation of Semiconductor Devices and Processes (Edited by Ryssel/Pichler). Vol. 6, pp. 372-379. Springer, Wien (1995).
-
(1995)
Simulation of Semiconductor Devices and Processes
, vol.6
, pp. 372-379
-
-
Van Dort, M.J.1
Slotboom, J.W.2
Woerlee, P.H.3
-
3
-
-
0027187367
-
Threshold voltage model for deep-submicrometer MOSFETs
-
Z.-H. Liu, Chenming Hu, Jian-Hui Huang, Tung-Yi Chan, Min-Chie Jeng, Ping K. Ko and Y. C. Cheng, Threshold voltage model for deep-submicrometer MOSFETs, IEEE Trans. Electron. Devices 40 (1) 86-95 (1993).
-
(1993)
IEEE Trans. Electron. Devices
, vol.40
, Issue.1
, pp. 86-95
-
-
Liu, Z.-H.1
Hu, C.2
Huang, J.-H.3
Chan, T.-Y.4
Jeng, M.-C.5
Ko, P.K.6
Cheng, Y.C.7
-
4
-
-
0027239315
-
Threshold voltage modeling and the subthreshold regime of operation of short-channel MOSFETs
-
T. A. Fjeldly and M. Shur, Threshold voltage modeling and the subthreshold regime of operation of short-channel MOSFETs, IEEE Trans. Electron. Devices 40 (1) 137-145 (1993).
-
(1993)
IEEE Trans. Electron. Devices
, vol.40
, Issue.1
, pp. 137-145
-
-
Fjeldly, T.A.1
Shur, M.2
-
5
-
-
0029357165
-
A new simplified threshold-voltage model for n-MOSFETs with nonuniformly doped substrate and its application to MOSFETs miniaturization
-
J.-J. Maa and C.-Y. Wu, A new simplified threshold-voltage model for n-MOSFETs with nonuniformly doped substrate and its application to MOSFETs miniaturization, IEEE Trans. Electron. Devices 42 (8) 1487-1494 (1995).
-
(1995)
IEEE Trans. Electron. Devices
, vol.42
, Issue.8
, pp. 1487-1494
-
-
Maa, J.-J.1
Wu, C.-Y.2
-
6
-
-
0039145957
-
A two-dimensional model for current flow in lateral bipolar transistor structures
-
(Edited by Selberherr/Stippel/Strasser). Springer, Wien
-
D. Freund, A. Klös and A. Kostka, A two-dimensional model for current flow in lateral bipolar transistor structures, in Simulation of Semiconductor Devices and Processes (Edited by Selberherr/Stippel/Strasser). Vol. 5, pp. 425-428, Springer, Wien (1993).
-
(1993)
Simulation of Semiconductor Devices and Processes
, vol.5
, pp. 425-428
-
-
Freund, D.1
Klös, A.2
Kostka, A.3
-
7
-
-
30244569609
-
An analytical model of current-splitting in CMOS-compatible lateral bipolar transistors
-
(Edited by Borel/Gentil/ Noblanc/Nouailhat/Verdone). Editions Frontieres
-
D. Freund, A. Klös and A. Kostka, An analytical model of current-splitting in CMOS-compatible lateral bipolar transistors, in ESSDERC 93 (Edited by Borel/Gentil/ Noblanc/Nouailhat/Verdone). pp. 29-32. Editions Frontieres (1993).
-
(1993)
ESSDERC 93
, pp. 29-32
-
-
Freund, D.1
Klös, A.2
Kostka, A.3
-
8
-
-
0030127156
-
Conformal mapping techniques for the analytical, two-dimensional calculation of currents in lateral bipolar transistor structures
-
D. Freund, A. Klös and A. Kostka, Conformal mapping techniques for the analytical, two-dimensional calculation of currents in lateral bipolar transistor structures, Solid-State Electron. 39 (4) 529-540 (1996).
-
(1996)
Solid-State Electron.
, vol.39
, Issue.4
, pp. 529-540
-
-
Freund, D.1
Klös, A.2
Kostka, A.3
-
9
-
-
0003608203
-
-
Wiley
-
Weber Electromagnetic Fields, Vol. 1, pp. 277-383. Wiley (1950).
-
(1950)
Electromagnetic Fields
, vol.1
, pp. 277-383
-
-
Weber1
-
10
-
-
0026187737
-
The shifted-rectangle approximation for simplifying the analysis of ion-implanted MOSFETs and MESFETs
-
S. Karmalkar and K. N. Bhat, The shifted-rectangle approximation for simplifying the analysis of ion-implanted MOSFETs and MESFETs, Solid-State Electron. 34 (7) 681-692 (1991).
-
(1991)
Solid-State Electron.
, vol.34
, Issue.7
, pp. 681-692
-
-
Karmalkar, S.1
Bhat, K.N.2
-
12
-
-
30244541339
-
A fully 2D, analytical model for the geometry and voltage dependence of threshold voltage in submicron MOSFETs
-
(Edited by Ryssel/Pichler). Springer, Wien
-
A. Klös and A. Kostka, A fully 2D, analytical model for the geometry and voltage dependence of threshold voltage in submicron MOSFETs, in Simulation of Semiconductor Devices and Processes (Edited by Ryssel/Pichler). Vol. 6, pp. 218-221. Springer, Wien (1995).
-
(1995)
Simulation of Semiconductor Devices and Processes
, vol.6
, pp. 218-221
-
-
Klös, A.1
Kostka, A.2
-
13
-
-
1642352098
-
-
Silvaco International
-
ATLAS II User's Manual, Silvaco International (1994).
-
(1994)
ATLAS II User's Manual
-
-
-
14
-
-
30244479984
-
-
Rel. 1.0, Anacad GmbH
-
ELDO-CFAS User's Manual, Rel. 1.0, Anacad GmbH (1994).
-
(1994)
ELDO-CFAS User's Manual
-
-
-
15
-
-
0029521766
-
A scaled 1.8 V, 0.18 μm gate length CMOS technology: Device design and reliability considerations
-
M. Rodder, S. Aur and L.-C. Chen. A scaled 1.8 V, 0.18 μm gate length CMOS technology: device design and reliability considerations, IEDM Technical Digest, pp. 415-418 (1995).
-
(1995)
IEDM Technical Digest
, pp. 415-418
-
-
Rodder, M.1
Aur, S.2
Chen, L.-C.3
|