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Volumn 39, Issue 12, 1996, Pages 1761-1775

A new analytical method of solving 2D poisson's equation in MOS devices applied to threshold voltage and subthreshold modeling

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; CONFORMAL MAPPING; MOSFET DEVICES; PARTIAL DIFFERENTIAL EQUATIONS; SEMICONDUCTOR DEVICE MODELS; SEMICONDUCTOR DOPING; SOLID STATE PHYSICS;

EID: 0030396983     PISSN: 00381101     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0038-1101(96)00122-0     Document Type: Article
Times cited : (69)

References (15)
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    • M. J. van Dort, J. W. Slotboom and P. H. Woerlee, Scaling of conventional MOSFETs to the 0.1 μm regime, in Simulation of Semiconductor Devices and Processes (Edited by Ryssel/Pichler). Vol. 6, pp. 372-379. Springer, Wien (1995).
    • (1995) Simulation of Semiconductor Devices and Processes , vol.6 , pp. 372-379
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  • 4
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    • Threshold voltage modeling and the subthreshold regime of operation of short-channel MOSFETs
    • T. A. Fjeldly and M. Shur, Threshold voltage modeling and the subthreshold regime of operation of short-channel MOSFETs, IEEE Trans. Electron. Devices 40 (1) 137-145 (1993).
    • (1993) IEEE Trans. Electron. Devices , vol.40 , Issue.1 , pp. 137-145
    • Fjeldly, T.A.1    Shur, M.2
  • 5
    • 0029357165 scopus 로고
    • A new simplified threshold-voltage model for n-MOSFETs with nonuniformly doped substrate and its application to MOSFETs miniaturization
    • J.-J. Maa and C.-Y. Wu, A new simplified threshold-voltage model for n-MOSFETs with nonuniformly doped substrate and its application to MOSFETs miniaturization, IEEE Trans. Electron. Devices 42 (8) 1487-1494 (1995).
    • (1995) IEEE Trans. Electron. Devices , vol.42 , Issue.8 , pp. 1487-1494
    • Maa, J.-J.1    Wu, C.-Y.2
  • 6
    • 0039145957 scopus 로고
    • A two-dimensional model for current flow in lateral bipolar transistor structures
    • (Edited by Selberherr/Stippel/Strasser). Springer, Wien
    • D. Freund, A. Klös and A. Kostka, A two-dimensional model for current flow in lateral bipolar transistor structures, in Simulation of Semiconductor Devices and Processes (Edited by Selberherr/Stippel/Strasser). Vol. 5, pp. 425-428, Springer, Wien (1993).
    • (1993) Simulation of Semiconductor Devices and Processes , vol.5 , pp. 425-428
    • Freund, D.1    Klös, A.2    Kostka, A.3
  • 7
    • 30244569609 scopus 로고
    • An analytical model of current-splitting in CMOS-compatible lateral bipolar transistors
    • (Edited by Borel/Gentil/ Noblanc/Nouailhat/Verdone). Editions Frontieres
    • D. Freund, A. Klös and A. Kostka, An analytical model of current-splitting in CMOS-compatible lateral bipolar transistors, in ESSDERC 93 (Edited by Borel/Gentil/ Noblanc/Nouailhat/Verdone). pp. 29-32. Editions Frontieres (1993).
    • (1993) ESSDERC 93 , pp. 29-32
    • Freund, D.1    Klös, A.2    Kostka, A.3
  • 8
    • 0030127156 scopus 로고    scopus 로고
    • Conformal mapping techniques for the analytical, two-dimensional calculation of currents in lateral bipolar transistor structures
    • D. Freund, A. Klös and A. Kostka, Conformal mapping techniques for the analytical, two-dimensional calculation of currents in lateral bipolar transistor structures, Solid-State Electron. 39 (4) 529-540 (1996).
    • (1996) Solid-State Electron. , vol.39 , Issue.4 , pp. 529-540
    • Freund, D.1    Klös, A.2    Kostka, A.3
  • 10
    • 0026187737 scopus 로고
    • The shifted-rectangle approximation for simplifying the analysis of ion-implanted MOSFETs and MESFETs
    • S. Karmalkar and K. N. Bhat, The shifted-rectangle approximation for simplifying the analysis of ion-implanted MOSFETs and MESFETs, Solid-State Electron. 34 (7) 681-692 (1991).
    • (1991) Solid-State Electron. , vol.34 , Issue.7 , pp. 681-692
    • Karmalkar, S.1    Bhat, K.N.2
  • 12
    • 30244541339 scopus 로고
    • A fully 2D, analytical model for the geometry and voltage dependence of threshold voltage in submicron MOSFETs
    • (Edited by Ryssel/Pichler). Springer, Wien
    • A. Klös and A. Kostka, A fully 2D, analytical model for the geometry and voltage dependence of threshold voltage in submicron MOSFETs, in Simulation of Semiconductor Devices and Processes (Edited by Ryssel/Pichler). Vol. 6, pp. 218-221. Springer, Wien (1995).
    • (1995) Simulation of Semiconductor Devices and Processes , vol.6 , pp. 218-221
    • Klös, A.1    Kostka, A.2
  • 13
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  • 15
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    • A scaled 1.8 V, 0.18 μm gate length CMOS technology: Device design and reliability considerations
    • M. Rodder, S. Aur and L.-C. Chen. A scaled 1.8 V, 0.18 μm gate length CMOS technology: device design and reliability considerations, IEDM Technical Digest, pp. 415-418 (1995).
    • (1995) IEDM Technical Digest , pp. 415-418
    • Rodder, M.1    Aur, S.2    Chen, L.-C.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.