Effect of substrate heating during excimer laser annealing on poly-Si TFT

Materials Research Society Symposium - Proceedings

Volumn 403, Issue , 1996, Pages 357-362

  Noguchi, T ^a   Tang, A J ^a   Tsai, J A ^a   Reif, R ^a  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; EFFECTS; EXCIMER LASERS; HEATING; SILICON; SUBSTRATES; TRANSISTORS;

CRYSTALLINITY; EXCIMER LASER ANNEALING; PULSE ENERGY DENSITY; WAFER;

ANNEALING;

EID: 0030396726     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (8)