NVESD microfactory: A new approach to Infrared Focal Plane Array manufacturing

Proceedings of the IEEE/CPMT International Electronic Manufacturing Technology (IEMT) Symposium

Volumn , Issue , 1996, Pages 205-211

  Dinan, J H ^a   Benson, J D ^a   Cornfeld, A B ^a   Martinka, M ^a   Johnson, J N ^a   Bratton, J ^a   Taylor, P ^a   Johs, B ^a   He, P ^a   Pittal, S ^a   Woollam, John A ^a  

^a NIGHT VISION AND ELECTRONIC SENSORS DIRECTORATE   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EPITAXIAL GROWTH; ETCHING; HETEROJUNCTIONS; INFRARED DEVICES; MILITARY APPLICATIONS; PHOTOLITHOGRAPHY; SEMICONDUCTING CADMIUM COMPOUNDS; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR DEVICE STRUCTURES; SEMICONDUCTOR DIODES; SEMICONDUCTOR GROWTH;

INFRARED FOCAL PLANE ARRAY (IRFPA); SEMICONDUCTOR WAFERS;

IMAGE SENSORS;

EID: 0030396572     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (5)