Photolithography of self-assembled monolayers: Optimization of protecting groups by an electroanalytical method

Canadian Journal of Chemistry

Volumn 74, Issue 12, 1996, Pages 2509-2517

  Jennane, Jamila ^a   Boutros, Tanya ^a   Giasson, Richard ^a  

^a UNIVERSITÉ DE MONTRÉAL   (Canada)

Author keywords

Cyclic voltammetry; Photolabile protecting groups; Photolithography; Self assembled monolayers; Surface modification

Indexed keywords

AGENTS; AMINES; CYCLIC VOLTAMMETRY; PHOTOLITHOGRAPHY; SURFACE TREATMENT; SYNTHESIS (CHEMICAL);

DIMETHOXYNITROSOBENZALDEHYDE; DIMETHYLDIMETHOXYBENZYLOXYCARBONYL; ELECTROANALYTICAL METHOD; NITROBENZYL; NITROSOBENZALDEHYDE; NITROVERATRYLOXYCARBONYL; PHOTODEPROTECTION; REAGENTS; SELF ASSEMBLED MONOLAYERS; TRIETHOXYSILYLPROPYLAMINE;

MONOLAYERS;

EID: 0030396525     PISSN: 00084042     EISSN: None     Source Type: Journal    
DOI: 10.1139/v96-281     Document Type: Article

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