Overall equipment effectiveness in resist processing equipment

IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop

Volumn , Issue , 1996, Pages 76-79

  Steege, Pete ^a  

^a FSI International   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AVAILABILITY; COST EFFECTIVENESS; EFFICIENCY; MATHEMATICAL MODELS; PHOTOLITHOGRAPHY; QUALITY CONTROL;

FLEXIBILITY; OVERALL EQUIPMENT EFFECTIVENESS MODEL; RATE OF QUALITY; RESIST PROCESSING EQUIPMENT;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0030396465     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (0)