Characterization of residual stress in metallic films on silicon with micromechanical devices

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2879, Issue , 1996, Pages 126-134

  Boutry, Mathilde ^a   Bosseboeuf, Alain ^a   Coffignal, G ^a  

^a UNIVERSITÉ PARIS SACLAY   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CANTILEVER MICROBEAMS; MICROBRIDGES; MICRORINGS;

BEAMS AND GIRDERS; CHARACTERIZATION; ETCHING; FABRICATION; METALLIC FILMS; PLASMA DEVICES; RESIDUAL STRESSES; SEMICONDUCTING SILICON;

MICROELECTROMECHANICAL DEVICES;

EID: 0030396286     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (14)