Optical interference filters made of porous silicon

Materials Research Society Symposium - Proceedings

Volumn 431, Issue , 1996, Pages 373-378

  Thoenissen, M ^a   Berger, M G ^a   Krueger, M ^a   Billat, S ^a   Arens Fischer, R ^a   Glueck, O ^a   Lueth, H ^a   Hilbrich, S ^a   Theiss, W ^a   Grosse, P ^a  

^a FORSCHUNGSZENTRUM JÜLICH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CURRENT DENSITY; DOPING (ADDITIVES); ELECTRON MICROSCOPES; ETCHING; MICROSTRUCTURE; PHOTODIODES; PHOTOLITHOGRAPHY; POROSITY; POROUS SILICON; REFLECTOMETERS; REFRACTIVE INDEX; THICKNESS MEASUREMENT;

BRAGG REFLECTORS; ELECTROCHEMICAL ETCH PROCESS; RUGATE FILTERS;

OPTICAL FILTERS;

EID: 0030396061     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (13)