Spectral analysis of polystyrene, polypropylene, and poly(methyl methacrylate) polymers in TOF SIMS and XPS by MO calculations using the model oligomers

Polymer Journal

Volumn 28, Issue 10, 1996, Pages 901-910

  Endo, Kazunaka ^a   Kobayashi, Naoya ^a   Aida, Masayuki ^a   Hoshi, Takahiro ^b  

^a University of Tokyo   (Japan)

^b ULVAC PHI Inc   (Japan)

Author keywords

Ab initio and semiempirical mos; Bond order polymer; Poly(methyl methacrylate); Polypropylene; Polystyrene; Positive secondary ions; Time of flight secondary ion mass spectroscopy (tof sims); Valence x ray photoelectron spectra (xps)

Indexed keywords

CHEMICAL BONDS; COMPUTATIONAL METHODS; COMPUTER SIMULATION; COMPUTER SOFTWARE; MATHEMATICAL MODELS; MOLECULAR STRUCTURE; OLIGOMERS; POLYMETHYL METHACRYLATES; POLYPROPYLENES; POLYSTYRENES; SECONDARY ION MASS SPECTROMETRY; X RAY PHOTOELECTRON SPECTROSCOPY;

BOND ORDERS; MOLECULAR ORBITAL (MO) CALCULATIONS; POSITIVE SECONDARY IONS; SOFTWARE PACKAGE HONDO7;

POLYMERS;

EID: 0030395826     PISSN: 00323896     EISSN: None     Source Type: Journal    
DOI: 10.1295/polymj.28.901     Document Type: Article

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