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Volumn 2876, Issue , 1996, Pages 71-85
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Photolithography equipment control through D-optimal design
a a a a |
Author keywords
[No Author keywords available]
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Indexed keywords
D-OPTIMAL DESIGN;
FALSE ALARMS;
EQUIPMENT;
INTEGRATED CIRCUIT MANUFACTURE;
MONITORING;
OPTIMIZATION;
PROCESS CONTROL;
TESTING;
PHOTOLITHOGRAPHY;
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EID: 0030395519
PISSN: None
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper |
Times cited : (2)
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References (5)
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