Low temperature hydrogen induced amorphous to crystalline silicon phase transformations

Materials Research Society Symposium - Proceedings

Volumn 420, Issue , 1996, Pages 283-288

  Fortmann, C M ^a   Hapke, P ^a   Lambertz, A ^a   Finger, F ^a  

^a STONY BROOK UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COMPOSITION; ETCHING; FILM GROWTH; HYDROGEN; LOW TEMPERATURE EFFECTS; PHASE TRANSITIONS; PLASMA APPLICATIONS; SEMICONDUCTOR GROWTH;

HYDROGEN TREATMENT; LAYER BY LAYER MICRO CRYSTALLINE SILICON GROWTH; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SEQUENTIAL DEPOSITION;

AMORPHOUS SILICON;

EID: 0030395197     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-420-283     Document Type: Conference Paper

References (11)