Novel technique for in-situ monitoring of crystallinity and temperature during rapid thermal annealing of thin Si/Si-Ge films on quartz/glass

Materials Research Society Symposium - Proceedings

Volumn 424, Issue , 1996, Pages 267-272

  Subramanian, V ^a   Degertekin, F L ^a   Dankoski, P ^a   Khuri Yakub, B T ^a   Saraswat, K C ^a  

^a STANFORD UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACOUSTIC WAVE VELOCITY MEASUREMENT; AMORPHOUS SILICON; ANNEALING; CRYSTALLINE MATERIALS; LIQUID CRYSTAL DISPLAYS; NUCLEATION; PHASE TRANSITIONS; QUARTZ; TEMPERATURE MEASUREMENT; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

ACTIVE MATRIX LIQUID CRYSTAL DISPLAYS; END POINT DETECTION;

SEMICONDUCTING SILICON COMPOUNDS;

EID: 0030394942     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (4)