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Volumn 169, Issue 3, 1996, Pages 435-442

Molecular beam epitaxy growth of indium-rich In xGa1-xAs/InyAl1-yAs/InP structures towards high channel conductivity for a high electron mobility transistor using a linearly graded buffer layer

Author keywords

[No Author keywords available]

Indexed keywords

CARRIER CONCENTRATION; ELECTRIC CONDUCTIVITY OF SOLIDS; ELECTRON TRANSPORT PROPERTIES; HIGH ELECTRON MOBILITY TRANSISTORS; MOLECULAR BEAM EPITAXY; SEMICONDUCTING GALLIUM ARSENIDE; SEMICONDUCTING INDIUM COMPOUNDS; SEMICONDUCTOR DEVICE MANUFACTURE; SUBSTRATES; TRANSMISSION ELECTRON MICROSCOPY;

EID: 0030394687     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0248(96)00412-5     Document Type: Article
Times cited : (6)

References (17)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.