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Volumn 169, Issue 3, 1996, Pages 435-442
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Molecular beam epitaxy growth of indium-rich In xGa1-xAs/InyAl1-yAs/InP structures towards high channel conductivity for a high electron mobility transistor using a linearly graded buffer layer
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Author keywords
[No Author keywords available]
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Indexed keywords
CARRIER CONCENTRATION;
ELECTRIC CONDUCTIVITY OF SOLIDS;
ELECTRON TRANSPORT PROPERTIES;
HIGH ELECTRON MOBILITY TRANSISTORS;
MOLECULAR BEAM EPITAXY;
SEMICONDUCTING GALLIUM ARSENIDE;
SEMICONDUCTING INDIUM COMPOUNDS;
SEMICONDUCTOR DEVICE MANUFACTURE;
SUBSTRATES;
TRANSMISSION ELECTRON MICROSCOPY;
HIGH CHANNEL CONDUCTIVITY;
LINEARLY GRADED BUFFER LAYER;
TWO DIMENSIONAL ELECTRON GAS CONCENTRATIONS;
HETEROJUNCTIONS;
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EID: 0030394687
PISSN: 00220248
EISSN: None
Source Type: Journal
DOI: 10.1016/S0022-0248(96)00412-5 Document Type: Article |
Times cited : (6)
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References (17)
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