Optical approach to evaluating the effects of chlorine on the quality of Si/SiO2 interfaces

Materials Research Society Symposium - Proceedings

Volumn 428, Issue , 1996, Pages 429-436

  Sherry, Julia ^a   Lowell, John ^a   Hossain, Tim ^a   Debusk, Damon ^a  

^a ADVANCED MICRO DEVICES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHLORINE; CMOS INTEGRATED CIRCUITS; INTERFACES (MATERIALS); IRON; LOGIC DEVICES; OPTICAL PROPERTIES; SEMICONDUCTING SILICON COMPOUNDS; SEMICONDUCTOR DEVICE STRUCTURES; SEMICONDUCTOR GROWTH; SODIUM; SURFACE PROPERTIES;

CONTACT POTENTIAL DIFFERENCE (CPD); SURFACE PHOTOVOLTAGE (SPV); THERMAL OXIDES;

MOS DEVICES;

EID: 0030394107     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-428-429     Document Type: Conference Paper

References (14)