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Volumn 35, Issue 12 B, 1996, Pages 6347-6695
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Proceedings of the 1996 9th International MicroProcess Conference, MPC'96
[No Author Info available]
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Author keywords
[No Author keywords available]
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Indexed keywords
CHEMICAL VAPOR DEPOSITION;
ELECTRON BEAM LITHOGRAPHY;
ELECTRON MICROSCOPY;
EXCIMER LASERS;
MASKS;
NANOSTRUCTURED MATERIALS;
PHOTOLITHOGRAPHY;
PHOTORESISTS;
PLASMA ETCHING;
SEMICONDUCTOR DEVICE MANUFACTURE;
THIN FILMS;
X RAY LITHOGRAPHY;
ARGON FLUORIDE EXCIMER LASERS;
CHEMICALLY AMPLIFIED RESIST;
EIREV;
FIELD EMITTER ARRAYS;
PATTERNING;
PROXIMITY EFFECTS;
ULTRAVIOLET LITHOGRAPHY;
X RAY MASK WRITER;
LITHOGRAPHY;
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EID: 0030391877
PISSN: None
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Conference Review |
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Times cited : (4)
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References (0)
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