Low resistivity transparent indium tin oxide (ITO) films sputtered at room temperature with H2O addition

Materials Research Society Symposium - Proceedings

Volumn 424, Issue , 1996, Pages 341-346

  Onisawa, Ken ichi ^a   Nishimura, Etsuko ^a   Ando, Masahiko ^a   Satou, Takeshi ^a   Takabatake, Masaru ^a   Minemura, Tetsuroh ^a  

^a HITACHI LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; ARGON; COMPOSITION EFFECTS; DECOMPOSITION; ELECTRIC CONDUCTIVITY OF SOLIDS; FILM PREPARATION; MAGNETRON SPUTTERING; PLASMAS; SEMICONDUCTING INDIUM COMPOUNDS; TRANSPARENCY; WATER;

INDIUM TIN OXIDE (ITO) FILMS; PATTERN DELINEATION PROPERTIES; TRANSPARENT CONDUCTIVE OXIDE (TCO) FILMS;

SEMICONDUCTING FILMS;

EID: 0030389549     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-424-341     Document Type: Conference Paper

References (6)