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Volumn 327, Issue , 1996, Pages 41-46

A method for measuring thermoreflectance using polarization modulation

Author keywords

[No Author keywords available]

Indexed keywords

LASER BEAMS; REFLECTOMETERS; REFRACTIVE INDEX; SILICON WAFERS; TEMPERATURE MEASUREMENT;

EID: 0030388569     PISSN: 02725673     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (5)

References (15)
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  • 4
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  • 5
    • 0000878614 scopus 로고
    • The Temperature Dependence of the Refractive Index of Silicon at Elevated Temperatures at Several Laser Wavelengths
    • Jellison, G.E. Jr., and Burke, H. H., 1986, "The Temperature Dependence of the Refractive Index of Silicon at Elevated Temperatures at Several Laser Wavelengths," J. Appl. Phys., Vol. 60, No. 2, pp. 841-843.
    • (1986) J. Appl. Phys. , vol.60 , Issue.2 , pp. 841-843
    • Jellison, G.E.1    Burke, H.H.2
  • 6
    • 4243093682 scopus 로고
    • Polarized Light and its Interactions with Modulating Devices
    • Kemp, J. C., 1987, "Polarized Light and its Interactions with Modulating Devices," Hillsboro OR: Hinds Instruments, Inc.
    • (1987) Hillsboro OR: Hinds Instruments, Inc.
    • Kemp, J.C.1
  • 7
    • 4243191178 scopus 로고    scopus 로고
    • A New Optical Method for Measuring Surface Temperature at Large Incidence Angles
    • in review
    • Lee, A. S., and Norris, P. M., 1996, "A New Optical Method for Measuring Surface Temperature at Large Incidence Angles," Rev. Sci. Instrum. (in review).
    • (1996) Rev. Sci. Instrum.
    • Lee, A.S.1    Norris, P.M.2
  • 8
    • 0347711148 scopus 로고
    • The Temperature Variation of the Emissivity of Metals in the Near InfraRed
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    • (1947) Proc. Phys. Soc. (London) , vol.59 , pp. 131-138
    • Price, D.J.1
  • 9
    • 0027622466 scopus 로고
    • Novel Technique for Noncontact and Microscale Temperature Measurements
    • Qiu, T. Q., Grigoropoulos, C. P., and Tien, C.-L., 1993, "Novel Technique for Noncontact and Microscale Temperature Measurements," Exp. Heat Trans., Vol. 6, pp. 231-241.
    • (1993) Exp. Heat Trans. , vol.6 , pp. 231-241
    • Qiu, T.Q.1    Grigoropoulos, C.P.2    Tien, C.-L.3
  • 10
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    • Microscale Thermal Phenomena in Contemporary Technology
    • Tien, C.-L., Qiu, T. Q., and Norris, P. M., 1994, "Microscale Thermal Phenomena in Contemporary Technology," Thermal Sci. & Eng., Vol. 2, No. 1, pp. 1-11.
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  • 11
    • 0001398662 scopus 로고
    • Photothermal Measurements on Optical Thin-films
    • Welsch, E., and Ristau, D., 1995, "Photothermal Measurements on Optical Thin-films," Appl. Optics, Vol. 34, No. 31, pp. 7239-7253.
    • (1995) Appl. Optics , vol.34 , Issue.31 , pp. 7239-7253
    • Welsch, E.1    Ristau, D.2
  • 12
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    • Coverage Dependence of Quantum Tunneling Diffusion of Hydrogen and Deuterium on Ni(111)
    • Wong, A., Lee, A., and Zhu, X. D., 1995, "Coverage Dependence of Quantum Tunneling Diffusion of Hydrogen and Deuterium on Ni(111)," Phys. Rev. B, Vol. 51, No. 7, pp. 4418-4425.
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    • Wong, A.1    Lee, A.2    Zhu, X.D.3
  • 13
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    • An Optical Ellipsometry Study of Adsorption and Desorption of Dueterium and Xenon on Nickel (111)
    • to appear
    • Wong, A., and Zhu, X. D., 1996, "An Optical Ellipsometry Study of Adsorption and Desorption of Dueterium and Xenon on Nickel (111)," Surf. Sci., (to appear).
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    • Wong, A.1    Zhu, X.D.2
  • 14
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    • Xiao, X.1    Xie, Y.2    Shen, Y.R.3
  • 15
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    • Multilayer Adsorption of Xenon, Krypton, and Argon on Graphite: An Ellipsometric Study
    • Youn, H. S., Meng, X. F., and Hess, G. B., 1993, "Multilayer Adsorption of Xenon, Krypton, and Argon on Graphite: An Ellipsometric Study," Phys. Rev. B, Vol. 48, pp. 14556-14576.
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.