High-performance metal-gate SOI CMOS fabricated by ultraclean low-temperature process technologies

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2875, Issue , 1996, Pages 28-38

  Ushiki, Takeo ^a   Hirano, Yuichi ^a   Shimada, Hisayuki ^a   Ohmi, Tadahiro ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL OPERATIONS; CLEANING; FABRICATION; LOW TEMPERATURE ENGINEERING; MOSFET DEVICES; PERFORMANCE; SEMICONDUCTING SILICON; SILICON ON INSULATOR TECHNOLOGY; TANTALUM; THIN FILMS;

POLYSILICON; ULTRACLEAN PROCESSES;

CMOS INTEGRATED CIRCUITS;

EID: 0030386213     PISSN: None     EISSN: None     Source Type: None    
DOI: 10.1117/12.250865     Document Type: Conference Paper

References (11)