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Volumn , Issue , 1996, Pages 1077-1080
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Preparation of high and low bandgap amorphous silicon by PECVD and their application in solar cell
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Author keywords
[No Author keywords available]
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Indexed keywords
AMORPHOUS SILICON;
CHEMICAL VAPOR DEPOSITION;
HELIUM;
HYDROGEN;
LIGHT ABSORPTION;
NANOSTRUCTURED MATERIALS;
OPTOELECTRONIC DEVICES;
SEMICONDUCTOR DEVICE MANUFACTURE;
SEMICONDUCTOR JUNCTIONS;
SEMICONDUCTOR PLASMAS;
SPECTROPHOTOMETERS;
THIN FILMS;
CHEMICAL ANNEALING METHOD;
HELIUM DILUTION;
HYDROGEN DILUTION;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
SILICON SOLAR CELLS;
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EID: 0030384810
PISSN: 01608371
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1109/pvsc.1996.564317 Document Type: Conference Paper |
Times cited : (2)
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References (5)
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