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Volumn , Issue , 1996, Pages 151-156
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Properties of LPcvd Si3N4/SiO2 film electret based on silicon
a
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Author keywords
[No Author keywords available]
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Indexed keywords
CHEMICAL VAPOR DEPOSITION;
DIELECTRIC PROPERTIES;
ELECTRETS;
ELECTRIC CHARGE;
FILM PREPARATION;
SEMICONDUCTOR DOPING;
SILICA;
SILICON NITRIDE;
SILICON WAFERS;
SPECTROSCOPY;
SURFACE TREATMENT;
THERMOOXIDATION;
CONSTANT VOLTAGE CORONA CHARGING;
ISOTHERMAL SURFACE POTENTIAL DECAY;
MEAN CHARGE DEPTH MEASUREMENT;
THERMALLY STIMULATED CURRENT SPECTRA;
DIELECTRIC FILMS;
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EID: 0030384396
PISSN: None
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper |
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Times cited : (2)
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References (6)
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