Pressure-induced phase transition of crystalline and amorphous silicon and germanium at low temperatures

High Pressure Research

Volumn 15, Issue 3, 1996, Pages 167-189

  Imai, Motoharu ^a,b   Mitamura, Takeshi ^a,c   Yaoita, Kenichi ^a,d   Tsuji, Kazuhiko ^a  

^a KEIO UNIVERSITY   (Japan)

^b NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

^c NISSAN MOTOR CO   (Japan)

^d UNIVERSITY OF TOKYO   (Japan)

Author keywords

Amorphization; Germanium; High pressure; Phase transition; Silicon; X ray diffraction

Indexed keywords

AMORPHIZATION; AMORPHOUS SILICON; CRYSTALLINE MATERIALS; GERMANIUM; HIGH PRESSURE EFFECTS IN SOLIDS; SYNCHROTRON RADIATION; THERMAL EFFECTS; X RAY DIFFRACTION ANALYSIS;

DIAMOND ANVIL CELLS;

PHASE TRANSITIONS;

EID: 0030383886     PISSN: 08957959     EISSN: None     Source Type: Journal    
DOI: 10.1080/08957959608240470     Document Type: Article

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