Aluminum passivation in saturated TMAHW solutions for IC-compatible microstructures and device isolation

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2879, Issue , 1996, Pages 242-250

  Sarro, Pasqualina M ^a   Brida, S ^a   Vlist, W ^a  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

DEVICE ISOLATION; TETRAMETHYL AMMONIUM HYDROXIDE;

ALUMINUM; CHEMICAL VAPOR DEPOSITION; DIELECTRIC FILMS; ETCHING; METALLIZING; MICROELECTRONICS; MICROMACHINING; MICROSTRUCTURE; PASSIVATION; SEMICONDUCTING SILICON;

INTEGRATED CIRCUITS;

EID: 0030383723     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (8)