Use of emissive probes in high pressure plasma

Review of Scientific Instruments

Volumn 67, Issue 12, 1996, Pages 4130-4137

  Yan, Shiluo ^a   Kamal, Husain ^a   Amundson, Jay ^a   Hershkowitz, Noah ^a  

^a University of Wisconsin Madison   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; CURRENT VOLTAGE CHARACTERISTICS; HELIUM; HIGH PRESSURE EFFECTS; IONIZATION; PLASMA DENSITY; PLASMAS; TEMPERATURE MEASUREMENT; THERMAL EFFECTS;

ELECTRON TEMPERATURE; EMISSIVE PROBES; INFLECTION POINT TECHNIQUE; LANGMUIR PROBES; PLASMA POTENTIAL; RADIOFREQUENCY POWER;

PROBES;

EID: 0030383165     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1147559     Document Type: Article

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