Microstructure and optical properties of aluminum nitride thin films

Materials Research Society Symposium - Proceedings

Volumn 403, Issue , 1996, Pages 539-544

  Watanabe, Yoshihisa ^a   Nakamura, Yoshikazu ^a   Hirayama, Shigekazu ^a   Naota, Yuusaku ^a  

^a NATIONAL DEFENSE ACADEMY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM COMPOUNDS; CHEMICAL VAPOR DEPOSITION; CURRENT DENSITY; EFFECTS; ION BEAMS; LASER ABLATION; MICROSTRUCTURE; OPTICAL PROPERTIES; REFRACTIVE INDEX; SPECTROMETERS; SPUTTERING; X RAY DIFFRACTION;

ALUMINUM NITRIDE THIN FILMS; ION BEAM ENERGY; KINETIC ENERGY; TRANSMISSION SPECTRA;

THIN FILMS;

EID: 0030382931     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (15)