Strain distribution near Si/NiSi2 interface measured by convergent beam electron diffraction

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 35, Issue 12 B, 1996, Pages

  Wakayama, Yutaka ^a   Takahashi, Yumiko ^a   Tanaka, Shun ichiro ^a  

^a JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL LATTICES; CRYSTAL ORIENTATION; ELECTRON DIFFRACTION; MECHANICAL VARIABLES MEASUREMENT; SEMICONDUCTING SILICON; STRAIN; STRESSES;

CONVERGENT BEAM ELECTRON DIFFRACTION; ISLAND; LATTICE STRAIN DISTRIBUTION;

INTERFACES (MATERIALS);

EID: 0030382366     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.35.l1662     Document Type: Article

References (16)