New technique for ohmic formation

Materials Research Society Symposium - Proceedings

Volumn 427, Issue , 1996, Pages 159-164

  Hara, S ^a   Teraji, T ^a   Okushi, H ^a   Kajimura, K ^a  

^a ELECTROTECHNICAL LABORATORY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CURRENT DENSITY; ELECTRONIC STRUCTURE; FERMI LEVEL; HYDROGENATION; INTERFACES (MATERIALS); OXIDATION; PH EFFECTS; SCHOTTKY BARRIER DIODES; SILICON CARBIDE; SOLUTIONS;

OHMIC FORMATION;

OHMIC CONTACTS;

EID: 0030381819     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-427-159     Document Type: Conference Paper

References (10)