Cobalt and titanium metallization of SiGeC for shallow contacts

Materials Research Society Symposium - Proceedings

Volumn 427, Issue , 1996, Pages 529-533

  Bair, A E ^a   Alford, T L ^a   Atzmon, Z ^a   Marcus, S D ^a   Doller, D C ^a   Morton, R ^a   Lau, S S ^a   Mayer, J W ^a  

^a ARIZONA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; COBALT; DIFFUSION IN SOLIDS; ELECTRON BEAMS; EPITAXIAL GROWTH; METALLIZING; RUTHERFORD BACKSCATTERING SPECTROSCOPY; TITANIUM; X RAY DIFFRACTION ANALYSIS;

KIRKENDAL VOIDING; SHALLOW CONTACT METALLIZATION; SOLID STATE REACTION;

SEMICONDUCTING SILICON COMPOUNDS;

EID: 0030381813     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-427-529     Document Type: Conference Paper

References (11)