Recrystallized silicon on SiO2-layers for thin film solar cells

Conference Record of the IEEE Photovoltaic Specialists Conference

Volumn , Issue , 1996, Pages 649-652

  Hebling, C ^a   Gaffke, R ^a   Lanyi, P ^a   Lautenschlager, H ^a   Schetter, C ^a   Wagner, B ^a   Lutz, F ^a  

^a FRAUNHOFER INSTITUTE FOR SOLAR ENERGY SYSTEMS ISE   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

BORON COMPOUNDS; CHEMICAL VAPOR DEPOSITION; CRYSTALLOGRAPHY; GASES; HEATING FURNACES; RECRYSTALLIZATION (METALLURGY); SEMICONDUCTOR DEVICE STRUCTURES; SEMICONDUCTOR PLASMAS; SILICA; SILICON WAFERS; SUBSTRATES; THIN FILMS;

LARGE AREA HEATER; LARGE AREA RECRYSTALLIZATION; LINE ELECTRON BEAM; ROCKING CURVE ANALYSIS; THIN FILM SOLAR CELLS; ZONE MELTING RECRYSTALLIZATION;

SILICON SOLAR CELLS;

EID: 0030381527     PISSN: 01608371     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (9)