Advanced endpoint solution for <1% open area applications; contact and via

IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop

Volumn , Issue , 1996, Pages 391-396

  Biolsi, Peter ^a   Drachnik, Liz ^a   Ellinger, Steve ^a   Morvay, Daniel ^a  

^a IBM MICROELECTRONICS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL POLISHING; ETCHING; INTEGRATED CIRCUIT MANUFACTURE; METALS; OXIDES; SEMICONDUCTING FILMS; SURFACES;

AUTOMATED ENDPOINT DETECTION; CHEMICAL MECHANICAL POLISHING;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0030381321     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (0)