Submicron resolution X-ray strain measurements on patterned films: Some hows and whys

Materials Research Society Symposium - Proceedings

Volumn 428, Issue , 1996, Pages 545-556

  Marcus, M A ^a   MacDowell, A A ^a   Isaacs, E D ^a   Evans Lutterodt, K ^a   Ice, G E ^a  

^a NOKIA RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL MICROSTRUCTURE; ELECTROMIGRATION; RELIABILITY; STRAIN MEASUREMENT; X RAY DIFFRACTION ANALYSIS;

BLECH LENGTH EFFECTS; LAUE SPOTS; X RAY STRAIN MEASUREMENT;

THIN FILMS;

EID: 0030380962     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-428-545     Document Type: Conference Paper

References (10)