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Volumn 9, Issue 6, 1996, Pages 46-

Emission microscope and passive voltage contrast: solving a problem quickly

Author keywords

[No Author keywords available]

Indexed keywords

DEFECTS; ELECTRIC GROUNDING; ELECTRON BEAMS; FAILURE ANALYSIS; HYDROFLUORIC ACID; LOGIC DEVICES; MICROSCOPES; OXIDES;

EID: 0030380169     PISSN: 09611290     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0961-1290(96)80098-6     Document Type: Article
Times cited : (3)

References (1)
  • 1
    • 1542374775 scopus 로고
    • A new technique to rapidly identify gate oxide leakage in field effect semiconductors using a scanning electron microscope
    • Jim Colvin A new technique to rapidly identify gate oxide leakage in field effect semiconductors using a scanning electron microscope ISTFA Symposium 1990
    • (1990)
    • Colvin, Jim1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.