Chemical-mechanical polishing: enhancing the manufacturability of MEMS

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2879, Issue , 1996, Pages 104-115

  Sniegowski, Jeffry J ^a  

^a SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL-MECHANICAL POLISHING; POLYSILICON;

FABRICATION; INTEGRATED CIRCUITS; MICROMACHINING; PHOTOLITHOGRAPHY; POLISHING; SEMICONDUCTING SILICON; SURFACE PHENOMENA; TECHNOLOGY;

MICROELECTROMECHANICAL DEVICES;

EID: 0030380160     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (16)