Recent progress in electron-beam cell projection technology

Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers

Volumn 35, Issue 12 B, 1996, Pages 6347-6695

  Yamashita, Hiroshi ^a   Nozue, Hiroshi ^a   Nomura, Eiichi ^a   Itoh, Katsuyuki ^a   Ema, Takahiro ^a   Hirasawa, Satomi ^a   Kojima, Katuyoshi ^a   Tamura, Takao ^a   Nakajima, Ken ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAMS; ELECTRON SCATTERING; FABRICATION; INSPECTION; MASKS; OPTIMIZATION; PERFORMANCE; PHOTORESISTS; RANDOM ACCESS STORAGE;

COULOMB INTERACTION; CRITICAL DIMENSION; ELECTRON BEAM CELL PROJECTION; PROXIMITY EFFECT;

ELECTRON BEAM LITHOGRAPHY;

EID: 0030379874     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Review

References (69)