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Volumn 420, Issue , 1996, Pages 635-640
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Calorimetric investigation of relaxation processes in disordered semiconductors
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Author keywords
[No Author keywords available]
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Indexed keywords
AMORPHOUS FILMS;
CRYSTAL MICROSTRUCTURE;
DIFFERENTIAL SCANNING CALORIMETRY;
ETCHING;
POROUS SILICON;
RELAXATION PROCESSES;
THERMAL EFFECTS;
ELECTROCHEMICAL ETCHING;
HYDROGENATED AMORPHOUS SILICON;
AMORPHOUS SILICON;
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EID: 0030379684
PISSN: 02729172
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1557/proc-420-635 Document Type: Conference Paper |
Times cited : (2)
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References (12)
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