1/f noise and thermal equilibration effects in hot wire deposited amorphous silicon

Materials Research Society Symposium - Proceedings

Volumn 420, Issue , 1996, Pages 641-646

  Khera, G M ^a   Kakalios, J ^a   Wang, Q ^a   Iwaniczko, E ^a  

^a UNIVERSITY OF MINNESOTA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CRYSTAL DEFECTS; ELECTRON TRANSPORT PROPERTIES; ENERGY GAP; HYDROGEN; SPURIOUS SIGNAL NOISE; THIN FILMS;

AMBIPOLAR DIFFUSION DEPOSITION; BAND GAP; DARK CONDUCTIVITY; DEFECT DYNAMICS; ELECTRONIC TRANSPORT; HOT WIRE CHEMICAL VAPOR DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR; STAEBLER-WRONSKI EFFECT; THERMAL EQUILIBRATION;

AMORPHOUS SILICON;

EID: 0030379509     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-420-641     Document Type: Conference Paper

References (14)