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Volumn 428, Issue , 1996, Pages 147-152
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Electromigration damage studied by 1/f noise
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Author keywords
[No Author keywords available]
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Indexed keywords
ELECTROMIGRATION;
FILM GROWTH;
MICROSCOPIC EXAMINATION;
NUCLEATION;
POLYCRYSTALLINE MATERIALS;
SEMICONDUCTING ALUMINUM COMPOUNDS;
SIGNAL NOISE MEASUREMENT;
SPURIOUS SIGNAL NOISE;
STRESS RELAXATION;
STRESSES;
THIN FILMS;
DIRECT CURRENT STRESS INTERRUPTION;
HIGH RESOLUTION ALTERNATING CURRENT NOISE MEASUREMENT;
SEMICONDUCTING FILMS;
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EID: 0030378864
PISSN: 02729172
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1557/proc-428-147 Document Type: Conference Paper |
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Times cited : (2)
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References (10)
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