Single-crystalline and bamboo Al lines fabricated by graphoepitaxy: Microstructure and 1/f noise measurements

Materials Research Society Symposium - Proceedings

Volumn 428, Issue , 1996, Pages 127-132

  Van Den Homberg, Marc J C ^a   Verbruggen, A H ^a   Alkemade, P F A ^a   Radelaar, S ^a  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CRYSTAL MICROSTRUCTURE; ELECTROMIGRATION; EPITAXIAL GROWTH; FILM GROWTH; GRAIN BOUNDARIES; MAGNETRON SPUTTERING; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING ALUMINUM COMPOUNDS; SEMICONDUCTING FILMS; SINGLE CRYSTALS; SPUTTER DEPOSITION;

BACKSCATTER KIKUCHI DIFFRACTION; BAMBOO ALUMINUM LINES; GRAPHOEPITAXY;

INTEGRATED CIRCUIT MANUFACTURE;

EID: 0030378692     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-428-127     Document Type: Conference Paper

References (17)