Spontaneous and STM-induced reaction of XeF2 with Si(111)-7 × 7 at low coverage

Nanotechnology

Volumn 7, Issue 4, 1996, Pages 356-359

  Balooch, M ^a   Siekhaus, W J ^a  

^a LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; ATOMS; CALCULATIONS; CHEMICAL REACTIONS; DEPOSITION; GASES; MICROSCOPES; MOLECULES; SCANNING TUNNELING MICROSCOPY; SILICON; SILICON COMPOUNDS;

SILICON FLUORIDE; XENON FLUORIDE;

SURFACES;

EID: 0030375929     PISSN: 09574484     EISSN: None     Source Type: Journal    
DOI: 10.1088/0957-4484/7/4/009     Document Type: Article

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