Electron spin resonance characterization of trapping centers in unibond® buried oxides

IEEE Transactions on Nuclear Science

Volumn 43, Issue 6 PART 1, 1996, Pages 2635-2638

  Conley Jr , J F ^a   Lenahan, P M ^a   Wallace, B D ^b  

^a DYNAMICS RESEARCH CORPORATION   (United States)

^b The Pennsylvania State University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITANCE MEASUREMENT; ELECTRON SPIN RESONANCE SPECTROSCOPY; HYDROGEN; ION IMPLANTATION; RADIATION DAMAGE; SEMICONDUCTOR JUNCTIONS; SILICA; VOLTAGE MEASUREMENT;

BURIED OXIDES; CHARGE TRAPPING CENTERS; SEPARATION BY IMPLANTED OXYGEN (SIMOX);

SILICON ON INSULATOR TECHNOLOGY;

EID: 0030375845     PISSN: 00189499     EISSN: None     Source Type: Journal    
DOI: 10.1109/23.556846     Document Type: Article

References (23)

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