Multicharged boron ions from pure elements evaporated in a 2.45-GHz ECR source

Proceedings of the International Conference on Ion Implantation Technology

Volumn , Issue , 1996, Pages 338-341

  Kato, Yushi ^a   Fukukawa, Atsuko ^a   Ishii, Shigeyuki ^a  

^a TOYAMA PREFECTURAL UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

BEAM PLASMA INTERACTIONS; BORON; ELECTRON CYCLOTRON RESONANCE; ION IMPLANTATION; ION SOURCES; IONIZATION OF SOLIDS; POWDER METALS; VAPOR PRESSURE; VAPORIZATION;

MAGNETIC MIRROR TRAP; MULTICHARGED BORON IONS;

PARTICLE BEAM EXTRACTION;

EID: 0030374652     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (3)